Temperature dependence of the erosion behavior of deuterium beam exposed tungsten-doped carbon films (a-C:W)

Tungsten-doped amorphous carbon films (a-C:W) are used as model system to study the deuterium (D) retention behavior and the erosion behavior of metal containing co-deposited layers. In our recent studies, the implantation temperature was increased towards an ITER relevant range. Pure and 7.5 at% tungsten-doped carbon films have been exposed to a deuterium beam of 200 eV/D at different implantation temperatures up to 1300 K and at a fluence of 1024 D/m2. Rutherford backscattering spectrometry with a 1.5 MeV +H beam was performed to obtain the total erosion yield. For each implantation condition and for each structure of doped films, the total erosion yield is reduced significant, compared to pure films. The temperature dependence of the total erosion yield is less pronounced for doped films.