Article ID Journal Published Year Pages File Type
1336482 Polyhedron 2011 6 Pages PDF
Abstract

In this paper non-stoichiometric tungsten oxide thin films have been successfully prepared by direct UV irradiation of bis-β-diketonate dioxotungsten(VI) precursor complexes spin-coated Si(1 0 0) substrates. Photodeposited films were characterized by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). The results of XRD analysis showed that the as-photodeposited WO3−x films are amorphous and have a rougher surface than thermally treated films. Post-annealing of the films in air at 500 °C transforms the sub-oxides to a monoclinic WO3 phase.

Graphical abstractTungsten oxide thin films have been successfully prepared by direct UV irradiation of amorphous films of tungsten(VI) dioxide β-diketonate complexes on Si(1 0 0) substrates. Photodeposited films were characterized by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM).Figure optionsDownload full-size imageDownload as PowerPoint slide

Related Topics
Physical Sciences and Engineering Chemistry Inorganic Chemistry
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