Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1482344 | Journal of Non-Crystalline Solids | 2012 | 5 Pages |
The effect of rare-earth elements on the plasma etching behavior of oxide glasses were investigated to develop the window glass for a plasma processing chamber in the semiconductor industry. Aluminosilicate glasses with various rare-earth elements (Y, Gd and La) were prepared and their optical transmittance and plasma etching depth were evaluated. The plasma etching behavior of the glasses was estimated by X-ray photoelectron spectroscopy analysis at the fluorine plasma exposure surface of the glasses. The rare-earth element in the glass was highly related to various properties such as density, molar volume, mechanical properties and plasma etching depth. The cationic field strength of the rare-earth element more strongly affected the plasma etching depth of the glasses than the sublimation point of the fluorine compounds and this may be related to the plasma etching condition.
► Cationic field strength of rare earth element affect on physical properties of the glasses. ► Glass containing Y showed highest plasma etching resistance. ► Rare-earth element remained more than Si and Al after plasma exposure. ► Rare-earth element containing aluminosilicate glass is a good candidate to replace quartz and sapphire for window glass.