Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1482698 | Journal of Non-Crystalline Solids | 2009 | 4 Pages |
Abstract
Modified chemical vapor deposition (MCVD) is the platform technology used to create a wide range of silica-based optical fibers. This paper reports on the extension of the reaction scheme embedded within a computational fluid dynamics model of the MCVD process to include chlorine dissociation and recombination. Simulations employing this modified kinetic scheme indicate that chlorine dissociation acts primarily as a ‘heat sink’ in cases where the operating conditions promote a high peak temperature in the narrow reaction zone where most of the SiCl4 oxidation occurs. The extended model allows a wider range of operating parameters to be examined in terms of the deposition profile of silica ‘soot’ particles on the substrate tube wall.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Catherine K.W. Cheung, David F. Fletcher, Geoffrey W. Barton,