Three-dimensional high-aspect-ratio recording in resist

We demonstrate a method of capillary force reduction during wet processing of three-dimensional structures photo-polymerized in resist by femtosecond pulses. A rinse in water was added as the final step of wet processing for recovery of free-standing photo-polymerized structures with feature sizes of ∼100 nm. The hydrophobicity of resist was utilized for reduction of the capillary drainage force. We show a possibility of holographical recording of a three-dimensional woodpile structure, which has a good permeability and can be fabricated by the proposed modified wet processing.