| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1483123 | Journal of Non-Crystalline Solids | 2008 | 4 Pages |
Abstract
Nanometer semiconductor titanium dioxide thin films have excellent properties of photocatalysitic degeneration. The glass coated TiO2 films is called self-cleaning glass. In this paper, chemical vapor deposition (CVD) method is employed to deposit TiO2 films on glass. The effect of spacing between nozzle and glass and the effect of substrate temperature on deposition rate are studied. The crystalline structure at different deposition temperatures is analyzed by XRD and anatase was found. And the microstructure of the TiO2 films is also determined by SEM. It shows that the size of crystal grain increases with the temperature.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Hongfu Sun, Chengyu Wang, Shihong Pang, Xiping Li, Ying Tao, Huajuan Tang, Ming Liu,