| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1484557 | Journal of Non-Crystalline Solids | 2008 | 10 Pages |
Abstract
Plasma-enhanced chemical vapor deposition (PE-CVD) low-dielectric (low-k) film was irradiated with ultra violet (UV) light of wavelength 172 nm to enhance mechanical strength and reduce dielectric constant (k value). The thickness measurement method for the UV annealed low-k film is discussed. The effects of UV irradiation on dielectric constant, shrinkage, stress, density, pore size, mechanical strength, and structure are clarified and the mechanism is discussed.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Yoshimi Shioya, Toshiyuki Ohdaira, Ryoichi Suzuki, Yutaka Seino, Kazuhiko Omote,