Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1484662 | Journal of Non-Crystalline Solids | 2008 | 5 Pages |
Abstract
Photocapacitance measurements were performed on amorphous silicon p-i-n detectors before and after particle irradiation with 1.5Â MeV 4 He+ ions. The spatial resolution across a degraded spot is similar to the one obtained in photocurrent scans and is of the order of the diameter of the scanning laser beam. We monitored the transient capacitance after applying short laser pulses to deduce trap energies of 0.64Â eV. Photocapacitance measurements as a function of the applied bias, the measurement frequency up to 1Â MHz, and the wavelength of laser light are discussed. The reduction in photocapacitance signal and the shift of the cut-off frequency after ion bombardment are correlated with the change in transport properties.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
R. Schwarz, U. Mardolcar, Y. Vygranenko, M. Vieira, C. Casteleiro, P. Stallinga, H. Gomes,