Article ID Journal Published Year Pages File Type
1484746 Journal of Non-Crystalline Solids 2008 6 Pages PDF
Abstract
Silica samples (type III, Corning 7940) were implanted with N using multiple energies to produce a layer ∼600 nm thick in which the concentration of N was constant to within ±5%. The optical absorption spectra of the samples were measured from 1.8 to 6.5 eV. Electron paramagnetic resonance (EPR) measurements were made at ∼20.3 and 33 GHz for sample temperatures ranging from 77 K to 100 K for most measurements. The components identified in the EPR spectra, based on comparison with reported parameters, were due to E′ centers and peroxy radicals. By comparing the changes in the optical absorption at 5.85 eV with the changes in the concentrations of the various EPR components and with the reports in the literature, we conclude that there is an additional band at 5.7-5.9 eV other than the E′ center band. We conclude that the bands between 2 and 6.5 eV and the EPR spectral components produced by implantation of N are due to radiation damage processes; neither optical bands nor EPR components related to N are detected.
Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
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