Article ID Journal Published Year Pages File Type
1486174 Journal of Non-Crystalline Solids 2006 5 Pages PDF
Abstract

In this study, SiOx thin films were prepared using reactive radio frequency magnetron sputtering at room temperature with a SiO sintered target. The obtained SiOx films were identified using X-ray diffraction, transmission electron microscopy, infrared absorption spectroscopy, X-ray photoelectron spectroscopy and ultraviolet–visible transmittance measurement. The x in SiOx film was controlled from 0.98 to 1.70 by changing the oxygen flow ratio at deposition. Increasing the oxygen flow ratio increased the optical gap of the SiOx films from 3.7 to greater than 6 eV.

Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
Authors
, ,