Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1499583 | Scripta Materialia | 2011 | 4 Pages |
A model describing the retraction kinetics of a fully faceted edge of a single crystalline thin film deposited on a non-wetting substrate is proposed. The kinetics of retraction is very similar to that of a fully isotropic film. The calculated topography profile of the edge exhibits a single maximum and no local minima (depressions). The implications for the solid-state dewetting mechanisms are discussed.
Research highlights► We propose a model describing the retraction kinetics of the fully faceted thin film edge. ► Fully faceted edges do not exhibit a depression which characterizes retracting isotropic edges. ► The absence of depression changes the mechanism of solid state dewetting of thin films. ► Our experimental data for thin Au-Fe films confirm the predictions of the model.