Indium tin oxide thin films crystallized at a low temperature using a nanocluster deposition technique

 The crystallized nanoclusters embedded in indium tin oxide films grown at ∼60 °C without substrate heating and the triangular granular microstructure of these films deposited at 180 °C, support the potential of low-temperature nanocluster deposition. The structural, electrical and optical properties of such films were investigated at temperatures of less than 260 °C. Films approximately 85 ± 5 nm thick exhibited the lowest resistivity (2.1 × 10−3 Ω cm) and a transparency greater than 80%.