| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1567113 | Journal of Nuclear Materials | 2010 | 7 Pages |
Abstract
The effects of dissolved oxygen on the electrochemical behavior and semiconductor properties of passive film formed on 316L SS in three solutions with different dissolved oxygen were studied by using polarization curve, Mott–Schottky analysis and the point defect model (PDM). The results show that higher dissolved oxygen accelerates both anodic and cathodic process. Based on Mott–Schottky analysis and PDM, the key parameters for passive film, donor density Nd, flat-band potential Efb and diffusivity of defects D0 were calculated. The results display that Nd(1−7 × 1027 m−3) and D0(1−18 × 10−16 cm2/s) increase and Efb value reduces with the dissolved oxygen in solution.
Related Topics
Physical Sciences and Engineering
Energy
Nuclear Energy and Engineering
Authors
Zhicao Feng, Xuequn Cheng, Chaofang Dong, Lin Xu, Xiaogang Li,