| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1630802 | Materials Today: Proceedings | 2016 | 7 Pages |
Nanostructured vanadium pentoxide (V2O5) thin films were deposited by dc reactive magnetron sputtering onto cleaned glass substrates. V2O5 thin films were deposited at a sputtering power of 70 W at room temperature and deposition the deposition time was varied from 10 to 30 min. Thickness value of V2O5 films increased from 180 to 320 nm with respect to deposition time. X-ray diffraction (XRD) patterns confirmed the formation of V2O5 with orthorhombic structure. Field-emission scanning electron microscope (FE-SEM) micrograph confirmed the formation of V2O5 nanosheets. V2O5 thin films exhibited response towards 5-200 ppm of 2-propanol at room temperature under the ambient atmosphere. V2O5 thin films showed excellent selectivity towards 2-propanol among various other target gases.
