| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1654413 | Materials Letters | 2006 | 6 Pages |
Abstract
In this paper, the interaction between the tungsten surface and the oxidizer was discussed by potentiodynamic polarization test in order to compare the chemical mechanical polishing (CMP) performances and electrochemical behavior of the tungsten film as a function of mixed oxidizers. The potentiodynamic polarization results indicated that the corrosion current densities of 5 wt.% Fe(NO3)3 + 5 wt.% H2O2 were higher than the other mixed oxidizers. Such an electrochemical corrosion effect implies that slurries with the highest removal rate (RR) have high dissolution rate.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Yong-Jin Seo, Nam-Hoon Kim, Woo-Sun Lee,