| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1664839 | Thin Solid Films | 2015 | 5 Pages |
•Cubic and tetragonal Li7La3Zr2O12 films were prepared by MOCVD.•Single-phase cubic Li7La3Zr2O12 film showed fine granular morphology.•Tetragonal Li7La3Zr2O12 film had polygonally faceted granular and columnar structure.•The highest deposition rate was 21.6 μm h− 1 for Li7La3Zr2O12 film.•(111)- and (100)-oriented La2Zr2O7 films were deposited.
Li7La3Zr2O12 films were prepared on polycrystalline Al2O3 by metal organic chemical vapor deposition. The effect of deposition temperature (Tsub) on the phase formation, morphology and deposition rates was investigated. Tetragonal Li7La3Zr2O12 film formed at Tsub = 1023–1173 K. The morphology changed from small-sized granular, polygonally faceted granular to flat and smooth surface with increasing Tsub. Cubic Li7La3Zr2O12 film with fine granular surface was deposited at Tsub = 1173–1223 K. The deposition rates of the cubic and tetragonal Li7La3Zr2O12 films were approximately 20 μm h− 1, which were one to two orders of magnitude greater than those of Li7La3Zr2O12 films by pulsed laser deposition.
