Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1680094 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2015 | 5 Pages |
Abstract
The dispersion of heavy ion deposited energy is explored in nanometric electronic devices. Experimental data are reported, in a large thin SOI diode and in a SOI FinFET device, showing larger distributions of collected charge in the nanometric volume device. Geant4 simulations are then presented, using two different modeling approaches. Both of them seem suitable to evaluate the dispersion of deposited energy induced by heavy ion beams in advanced electronic devices with nanometric dimensions.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
M. Raine, M. Gaillardin, P. Paillet, O. Duhamel, M. Martinez, H. Bernard,