Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1787181 | Current Applied Physics | 2009 | 5 Pages |
Abstract
We numerically study the effect of the gas injection position in an inductively coupled plasma (ICP) discharge. To study the effect, we present an injection model when a nozzle is placed inside of the chamber. The results show that the dependency of the neutral density is sensitive, while the difference of the charged particle density is negligible. The electron temperature difference at the injection positions increases slightly when the pressure decreases.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Deuk Chul Kwon, N.S. Yoon, J.H. Han, J.W. Shon,