| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1787218 | Current Applied Physics | 2012 | 4 Pages |
Abstract
⺠Thermal Stability of modified ALD-RuO2 was investigated under NH3 and N2 ambient. ⺠Modified ALD-RuO2 film was effectively reduced to Ru under NH3 than N2 ambient. ⺠The reduced Ru film had a high density and smooth surface without any voids formation.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Jin-Hyock Kim, Ji-Hoon Ahn, Sang-Won Kang, Jae-Sung Roh, Se-Hun Kwon, Ja-Yong Kim,