| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1787715 | Current Applied Physics | 2011 | 4 Pages |
Abstract
We optimized the Al interlayer that was deposited by CVD on UV-exposed TiO2 surfaces and investigated the effect of the Al interlayer on CVD of Pt. TiO2 surfaces irradiated with UV-exposure increased the concentration of hydroxyl groups, which allowed for uniform nucleation and enhanced growth of the Al interlayer. The Al coated TiO2 influenced the CVD of Pt, enhancing the growth rate and the inter-connectivity on Al/TiO2 surfaces. X-ray diffraction patterns revealed the degree of crystallinity of the Al interlayer on UV-exposed TiO2 surfaces and the Pt deposited on Al/UV-exposed TiO2. In addition, a tape test showed enhanced adhesion properties of Pt due to the direct chemical bond formation of Pt and the Al interlayer.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Mohammad Arifur Rahman, Ara Kim, Chiyoung Lee, Jungseok Han, Hoesup Soh, Ho-seok Nam, Hyun Ruh, Jaegab Lee,