Article ID Journal Published Year Pages File Type
1787839 Current Applied Physics 2011 5 Pages PDF
Abstract
► Ti-doped and TiAl-doped a-C:H films were deposited by magnetron sputtering technique. ► Al doping made the surface smoothen, lowered the residual stress and improved the film toughing. ► TiAl-doped a-C:H films possessed lower wear rate and friction coefficient.
Keywords
Related Topics
Physical Sciences and Engineering Physics and Astronomy Condensed Matter Physics
Preview
Effects of Al incorporation on the mechanical and tribological properties of Ti-doped a-C:H films deposited by magnetron sputtering
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