Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1787977 | Current Applied Physics | 2006 | 4 Pages |
Abstract
The resolution of a near-field lithography technique that uses a planar silver lens to form a near-field image has been investigated and compared with hard-contact lithography. Sub-diffraction-limited imaging has been observed through a 50Â nm silver film, confirming a recent superlensing proposal [J.B. Pendry, Phys. Rev. Lett. 85 (2000) 3966], with grating periods down to 170Â nm pitch being patterned into resist using simple broadband UV-illumination.
Related Topics
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Authors
D.O.S. Melville, R.J. Blaikie, M.M. Alkaisi,