| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1788341 | Current Applied Physics | 2008 | 6 Pages |
Abstract
In the past decade nanoimprint has been developed to a serious alternative for next generation lithography (NGL). In this work, the most recent developments of UV-nanoimprint Lithography (UV-NIL) with special emphasis to the work accomplished at AMO and the IHT-RWTH Aachen are reviewed and functional applications demonstrated. Further the potentials of various UV-NIL concepts are evaluated and possible interests in certain application areas are discussed.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
A. Fuchs, M. Bender, U. Plachetka, L. Kock, N. Koo, T. Wahlbrink, H. Kurz,