Highly conformal growth of microstructured polypyrrole films by electrosynthesis on micromachined silicon substrates

A novel technology for fabricating microstructured polypyrrole (PPy) films is presented based on PPy electrosynthesis on micromachined silicon substrates. PPy light-activated electropolymerization is performed on n-type microstructured silicon featuring lattices of square-like pores with pitch of 8 μm, size (s) of 5 μm, and depth (d) from 5 μm up to 50 μm. Scanning electron microscopy (SEM) highlights as light-activation allows a highly conformal polymer growth yielding a three-dimensional PPy structure perfectly replicating the silicon microstructure to be achieved up to high aspect-ratio (HR = d/s). Arrays of highly ordered PPy hollow microtubes with depth up to 50 μm and thickness up to 1 μm are obtained. Chemical analysis of microstructured PPy films is performed by X-ray photoelectron spectroscopy (XPS) and their electrochemical activity is verified by cyclic voltammetry (CV).

► A novel technology for preparing microstructured PPy films is presented. ► PPy light-activated electropolymerization is performed on microstructured n-type silicon. ► PPy hollow microtubes are fabricated by replication of the silicon microstructured template. ► A highly conformal PPy film growth with high aspect-ratio is achieved. ► PPy hollow microtubes with thickness from nanometer to micrometer scale are obtained.