Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
180563 | Electrochemistry Communications | 2010 | 4 Pages |
Abstract
In this work, we developed a method combining lithography and metal-catalyzed Si etching to fabricate highly ordered Si wire arrays with uniform coverage over an entire 4 in. wafer. The wire periodicity and dimensions depend on the lithography and the etching conditions. Photoelectrochemical measurements show that the as-prepared Si wire samples are photoactive owing to surface enhancement and become especially effective in solar-to-electrical conversion and water splitting after surface modification with Pt nanoparticles.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Xin Wang, Kui-Qing Peng, Xiao-Ling Wu, Shuit-Tong Lee,