Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
180577 | Electrochemistry Communications | 2010 | 5 Pages |
Abstract
Metal-assisted etching into Si (1 0 0) surfaces can be performed in a highly defined and regular arrangement using self-organized patterns of single-size gold catalyst particles that are block polymer templated on Si surfaces. We show that small size catalyst particles (diameter ≈10 nm) can be forced to maintain straight etch tracks perpendicular to the surface using adequate centrifugal gravity force. This allows the creation of highly ordered uniform and synchronized pore boring into the substrate with single pore diameters in the 10 nm range.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Sebastian Bauer, Johannes G. Brunner, Himendra Jha, Yukiko Yasukawa, Hidetaka Asoh, Sachiko Ono, Heike Böhm, Joachim P. Spatz, Patrik Schmuki,