| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 180839 | Electrochemistry Communications | 2010 | 4 Pages |
Abstract
The evolution of surface width during growth of copper islands is studied in the kinetic regime, allowing control of island shape as well as island density. We show that film roughness at island coalescence is determined by island density, island shape, and the island growth kinetics. The connection between the kinetics of island growth and film growth provides the scientific basis for control of surface roughness.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Lian Guo, Peter C. Searson,