Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
182707 | Electrochemistry Communications | 2006 | 8 Pages |
Abstract
A new, low production cost, technique for the preparation of boron-doped diamond electrodes (BDD) is presented. The technique is based on mechanical implantation of BDD particles into a titanium substrate. The electrochemical characterization of low coverage mechanically implanted boron-doped diamond electrodes was performed using the Fe(CN)64-/3- redox couple and compared with the BDD thin-films electrodes. The interpretation of the recorded voltammetric responses was based on microelectrodes-array theory. The thickness of the diffusion layer, the spacing of particles and equivalent particle dimension was considered. Depending on the potential scan rate the linear or spherical diffusion with partial overlap was observed.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Agnieszka Cięciwa, Rolf Wüthrich, Christos Comninellis,