| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1828248 | Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment | 2009 | 4 Pages |
Abstract
In this paper, first results of finishing EUV mirror substrate surface shape to given parameters using correction methods such as vacuum thin films deposition and local ion-beam etching through the mask are presented. For spherical mirror substrate with radius of curvature R=260 mm and a diameter of 130 mm, obtained values of PV=4.7 nm and RMS=0.6 nm.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Instrumentation
Authors
N.I. Chkhalo, E.B. Kluenkov, A.E. Pestov, V.N. Polkovnikov, D.G. Raskin, N.N. Salashchenko, L.A. Suslov, M.N. Toropov,