Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1883154 | Radiation Physics and Chemistry | 2009 | 4 Pages |
Abstract
GaMnAs layers on (0Â 0Â 1)-oriented GaAs substrates were grown by the molecular beam epitaxy (MBE) method. Structural properties of samples processed at up to 920Â K under hydrostatic Ar pressure up to 1.1Â GPa were investigated by X-ray, secondary ion mass spectroscopy and atomic force microscopy methods. The sign of strain (compressive or tensile) of the GaMnAs layers, related to a creation of MnAs nanoclusters, is found to be dependent on processing conditions and on primary structure defects, whereas it was independent of Mn concentration. An influence of the defects structure in as-grown samples on the strain state of processed GaMnAs layers is discussed.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Radiation
Authors
J. Bak-Misiuk, J.Z. Domagala, P. Romanowski, E. Dynowska, E. Lusakowska, A. Misiuk, W. Paszkowicz, J. Sadowski, A. Barcz, W. Caliebe,