| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1891425 | Radiation Physics and Chemistry | 2013 | 5 Pages |
Abstract
New developments in nanoscience and nanotechnology require nanometer scale resolution imaging tools and techniques such as an extreme ultraviolet (EUV) and soft X-ray (SXR) microscopy, based on Fresnel zone plates. In this paper, we report on applications of a desk-top microscopy using a laser-plasma EUV source based on a gas-puff target for studies of morphology of thin silicon membranes coated with NaCl crystals and samples composed of ZnO nanofibers.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Radiation
Authors
P.W. Wachulak, A. Bartnik, A. Baranowska-Korczyc, D. Pánek, P. Brůža, J. Kostecki, Ł. Węgrzyński, R. Jarocki, M. Szczurek, K. Fronc, D. Elbaum, H. Fiedorowicz,