| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1891764 | Radiation Physics and Chemistry | 2011 | 6 Pages |
Abstract
In order to develop chemically amplified radiation resist having ability of acid multiplication, acid formation in γ-irradiated polymer films and solutions of acetal compounds containing diphenyliodonium salt has been studied. Acids were generated in the films and solutions by chain reactions of large G-value. The G-value depends on the chemical structure of the polymers and acetal compounds. Compounds containing cyclic acetal structure give large G-values. This dependence can be explained by difference in the possibility of electron transfer from radicals of the polymers and acetal compounds to diphenyliodonium salt. Polyvinyl acetals will be a candidate for the dually amplified resist.
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Radiation
Authors
Hitoshi Koizumi, Mitsuhiro Terae, Kenta Yamazaki, Kouji Iino,