| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 239656 | Procedia Chemistry | 2009 | 4 Pages |
A class of nanoporous TiO2 gas sensors processed by novel anodic aluminum oxidation (AAO) of Al thin films and microelectromechnical systems (MEMS) techniques are presented. To enhance the sensitivity and reduce the sensing dimensions of a gas sensor, a nanoporous surface of the gas-sensitive material on the sensor is required. These sensors can be implemented on silicon or silicon dioxide substrate featuring a thin membrane of micro-hotplate structure featuring micro-heaters, thermometers and electrodes, and thus operate as chemoresistive devices. Combining the AAO method with dry-etch process, a homogeneous and nanoporous SiO2 surface of the sensor can be effectively configured by modulating various hole diameters and depth, hence replacing conventional photolithography and electrochemical etch. The process integration including AAO, reactive ion etch (RIE) and microfabrication is mainly developed and a feasibility study of PVD TiO2 thin film deposition upon the porous device is also provided. TiO2 thin films deposited on the nanoporous surface are investigated and compared with non-porous TiO2 films. It is encouraging that our fabrication process is able to provide relatively high surface area to enhance sensitivity of the sensor without additional doping steps. Our promising experimental results have revealed these miniature and cost-effective devices are not only compatible, but applicable to smart bio-chemical sensors of next generation.
