Wettability and Optical Studies of Films Prepared from Power Variation of Co-sputtered Cr and Zr Targets by Sputtering

The aim of this paper is to investigate the effect of power variation on thin films deposited by co-sputtering metal targets of chromium and zirconium by reactive magnetron sputtering. The well crystalline chromium oxide and zirconium oxynitride films with different orientations are observed only when the power for one of the target is equal to or more than 90W. The contact angle and surface energy of the deposited films were measured by contact angle measuring system. The deposited films exhibit hydrophobic behavior with the increase of target powers and the contact angle of 90° or more is observed when the power for one of the target is 90W or more. The refractive index and packing density of the deposited films increases gradually with the increase of target powers. The band gap of chromium oxide and zirconium oxynitride films increases with the increase of their respective target powers.