Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5006097 | Materials Science in Semiconductor Processing | 2017 | 4 Pages |
Abstract
We demonstrate a self-aligned process to fabricate Vertical-Cavity Surface-Emitting Lasers (VCSEL) which combines, within a single lithographic step the mesa etch, the surface passivation, the opening of the emission window and the top annular metallization. This process flow, based on a double photoresist layer enabling two lift-off steps, offers great advantages such as easy and fast implementation while insuring a perfect alignment between the emitting window, the passivation layer aperture and the metal-ring contact. VCSEL fabrication is drastically simplified and its repeatability improved. Finally, this process can be advantageously applied to other photonic devices such waveguide-ridge lasers, modulators, LED, etc.
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Authors
Ludovic Marigo-Lombart, Alexandre Arnoult, Laurent Mazenq, Pascal Dubreuil, Benjamin Reig, Nicolas Mauran, Hugo Thienpont, Krassimir Panajotov, Guilhem Almuneau,