Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5420005 | Progress in Surface Science | 2012 | 19 Pages |
Abstract
⺠Formation and Stability of oxide-free, H-terminated Si surfaces. ⺠Direct and indirect functionalization of oxide-free, H-terminated Si surfaces. ⺠Nanopatterning of Si(111) as a selective surface-chemistry route. ⺠Activation and functionalization of nanopatterned, oxide-free Si(111) surfaces.
Keywords
KMCODPANNNTFTMPAUHVNanopatterningLbLSAMOctadecylphosphonic acidAFMDFTMOFsALDMethylphosphonic acidSilicon oxidebromineFourier transform infraredThin film transistorSelf-assembled monolayersSelf-assembled monolayerKinetic Monte CarloHydrogen-terminationUltra-high vacuumRoom temperatureAtomic layer depositionSilicon surfacessiliconSiO2X-ray photoelectron spectroscopyFT-IRXPSSurface activationFluorinePhotoluminescenceMetal organic frameworksLayer-by-layerMonolayeratomic force microscopynearest neighborDensity functional theoryHydrogenhydroxylOrganic functionalizationChlorineIodine
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Peter Thissen, Oliver Seitz, Yves J. Chabal,