Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5435433 | Synthetic Metals | 2017 | 6 Pages |
â¢P3HT-PVA transistors were fabricated by photolithography and plasma etching.â¢Source â drain current was directly proportional to channel length.â¢Transistors were submitted to drain current stress and degradation was observed.â¢Reduction in transistor response was related to reduction in charge carrier mobility.â¢The total charge that crossed the transistor was responsible for the degradation.
Top gate-bottom contacts transistors of Poly 3-hexylthiophene (P3HT) and cross-linked Poly Vinyl Alcohol (PVA) with different channel lengths were fabricated by standard photolithography and plasma etching. The transistors presented excellent charge mobility, high ION/IOFF and temporal stability. Drain current was directly proportional to channel length. The transistors were submitted to extended current-voltage measurements and drain current degradation was observed. Reduction in transistor response was found to be related to reduction in charge carrier mobility. Drain Current as a function of the integral charge passing through the channel was investigated. The higher the integrated source â drain current that crossed the transistor, the more prominent was the degradation. The degradation followed the same pattern and persisted indefinitely. The reasons for this behavior are discussed.