| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5441558 | Journal of Non-Crystalline Solids | 2016 | 5 Pages |
Abstract
Hydrogenated amorphous silicon nitrides (a-SiNx:H) and oxycarbides (a-SiOxCy:H) have been grown by means of plasma enhanced chemical vapor deposition (PECVD) at a low power density (40-60Â mW/cm2) using silane, ammonia, methane and carbon dioxide as silicon, nitrogen, carbon and oxygen precursors, respectively. Their refractive index dispersion curves have been analyzed by means of specular reflectance spectroscopy and their structural properties by FTIR spectroscopy. Taking advantage of their optical properties, the alloys have been fruitfully applied in dielectric stratified structures, optimized for the propagation of surface electromagnetic waves.
Keywords
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Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Pietro Mandracci, Francesca Frascella, Riccardo Rizzo, Alessandro Virga, Paola Rivolo, Emiliano Descrovi, Fabrizio Giorgis,