Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5461795 | Materials Today: Proceedings | 2017 | 6 Pages |
Abstract
Transparent conductive aluminum-doped zinc oxide (ZnO:Al or AZO) thin films were fabricated by the pulsed DC magnetron sputtering deposition. The prepared AZO thin films were carefully treated with the argon plasma treatments in the vacuum state with a variety of the plasma conditions, i.e., the control power and the operated pressure. The plasma-treated AZO samples were then investigated for their crystal structures by X-ray diffraction (XRD). Their physical morphologies and surface topologies were examined by field emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM). Electrical properties of the samples were measured with the four-point probe and the Hall effect measurements. Finally, their optical transmission was observed with the UV-Vis-NIR spectrophotometry. The results from the as-deposited and the plasma-treated AZO thin films will be compared and discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
P. Muthitamongkol, C. Thanachayanont, B. Samransuksamer, K. Seawsakul, M. Horprathum, P. Eiamchai, S. Limwichean, V. Patthanasettakul, N. Nuntawong, P. Songsiriritthiguland, P. Chindaudom,