| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 594153 | Colloids and Surfaces A: Physicochemical and Engineering Aspects | 2012 | 6 Pages |
Abstract
⺠The reaction of trimethylsilyl cellulose thin films with HCl vapor is studied. ⺠QCM-D allows an in situ monitoring of this reaction under ambient atmosphere. ⺠Rate constants for this reaction have been determined. ⺠The reaction proceeds via a first fast phase and a second slower phase. ⺠The formed cellulose films show a layer thickness of 23 nm.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Tamilselvan Mohan, Stefan Spirk, Rupert Kargl, AleÅ¡ DoliÅ¡ka, Heike M.A. Ehmann, Stefan Köstler, Volker Ribitsch, Karin Stana-Kleinschek,