Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
594936 | Colloids and Surfaces A: Physicochemical and Engineering Aspects | 2011 | 8 Pages |
Abstract
â¶ A spontaneous formation of N-[3-trimethoxysilyl)propyl]diethylenetriamine (C10H27N3O3Si, TRIS in short) self-assembled monolayers (SAMs) on silica particles for water treatment without the use of any organic solvents. â¶ A range of TRIS concentration study reveals that monolayer formation is facilitated only up to low concentration of TRIS (0.32Â mmol/g), above which multilayer predominates. â¶ The characterisation of the samples via zeta potential measurements, TGA, titration, PA-FTIR, and XPS clearly indicates TRIS multilayer formation at TRIS concentration at and above 0.65Â mmol/g during synthesis. â¶ Data have shown promising outcomes in the removal of natural organic matter in water industry.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Candace C.P. Chan, Namita Roy Choudhury, Peter Majewski,