| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 597004 | Colloids and Surfaces A: Physicochemical and Engineering Aspects | 2008 | 4 Pages |
Abstract
Photoacid generators (PAGs) have been widely used as a key component in the development of chemically amplified photoresist. In this study, a PAG with good thermal stability and an electron-withdrawing group was applied to AFM anodization lithography. Specifically, triarylsulfonium salts (TAS) such as a diphenyl(4-tert-butoxycarbomethoxyphenyl)-sulfonium triflate (DTCPS-Tf) and triphenyl-sulfonium triflate (TPS-Tf) were used successfully to fabricate anodized nanostructures by AFM anodization lithography. In addition, the effect of electron-withdrawing materials and optimized lithographic conditions were studied through a systematic alteration of lithographic factors such as applied voltage, lithographic speed, and humidity.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Eujean Jang, Gijin Kwun, Wansik Choi, Haiwon Lee,