| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 597128 | Colloids and Surfaces A: Physicochemical and Engineering Aspects | 2008 | 4 Pages |
Abstract
The role of the Plateau borders in the patterning occurring under the rapid evaporation of polymer solutions is discussed. The capillary gradient formed along the Plateau border results in the intensive migration of bubbles towards the knots of the pattern network. A semi-quantitative model of the bubbles migration in terms of the border curvature and velocity of transport is presented.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Edward Bormashenko, Doron Aurbach, Gene Whyman, Tamir Stein, Yelena Bormashenko, Roman Pogreb,