Adsorption of toluene on Si(1 0 0)/SiO2 substrate and mesoporous SBA-15

Adsorption of toluene on Si(1 0 0)/SiO2 substrate and mesoporous SBA-15 has been studied by using energy dispersive X-ray analysis (EDAX), Fourier transform infrared (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) techniques. Contact angle technique is used to study the adsorption kinetics of toluene on Si(1 0 0)/SiO2 and thermal stability of adsorbed toluene layer. Scanning electron microscopy (SEM) technique is used to observe SBA-15 particles before and after toluene adsorption. Thermogravimetric (TGA) technique is employed to understand the thermal behavior of toluene layer on SBA-15. Adsorption kinetics fit fairly well with Langmuir isotherms giving adsorption rate constant, ka = 0.000054 M−1 S−1. SEM pictures clearly reveal assembly of SBA-15 particles mediated by toluene adsorption. EDAX and XPS results confirm toluene adsorption. FTIR results show presence of aromatic bends, ring stretch, combination bands, CH stretch, methyl CH symmetric and asymmetric stretches indicating toluene adsorption. Thermal stability study also indicates toluene adsorption.