Article ID Journal Published Year Pages File Type
607321 Journal of Colloid and Interface Science 2014 8 Pages PDF
Abstract

•Increasing the MW heating power resulting to the enhancement of crystal growth.•MSN450 demonstrated the highest crystallinity and longest range of silica order.•MSN450 displayed better morphology and a hexagonal silica arrangement.•MSN450 adsorbed almost same ibuprofen than conventional MSN.•MSN450 showed the slowest drug release due to long silica order and channel pathway.

Mesoporous silica nanoparticles (MSNs) were synthesized with variable microwave power in the range of 100–450 W, and the resulting enhancement of MSN crystal growth was evaluated for the adsorption and release of ibuprofen. X-ray diffraction (XRD) revealed that the MSN prepared under the highest microwave power (MSN450) produced the most crystallized and prominent mesoporous structure. Enhancement of the crystal growth improved the hexagonal order and range of silica, which led to greater surface area, pore width and pore volume. MSN450 exhibited higher ibuprofen adsorption (98.3 mg/g), followed by MSN300 (81.3 mg/g) and MSN100 (74.1 mg/g), confirming that more crystallized MSN demonstrated higher adsorptivity toward ibuprofen. Significantly, MSN450 also contained more hydroxyl groups that provided more adsorption sites. In addition, MSN450 exhibited comparable ibuprofen adsorption with conventionally synthesized MSN, indicating the potential of microwave treatment in the synthesis of related porous materials. In vitro drug release was also investigated with simulated biological fluids and the kinetics was studied under different pH conditions. MSN450 showed the slowest release rate of ibuprofen, followed by MSN300 and MSN100. This was due to the wide pore diameter and longer range of silica order of the MSN450. Ibuprofen release from MSN450 at pH 5 and 7 was found to obey a zero-order kinetic model, while release at pH 2 followed the Kosmeyer–Peppas model.

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Physical Sciences and Engineering Chemical Engineering Colloid and Surface Chemistry
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