Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
609125 | Journal of Colloid and Interface Science | 2010 | 6 Pages |
Abstract
⺠The mixing induced by swift heavy ions at W/Si interface has been reported first time through this article. ⺠GIXRD result shows the formation of two type of tungsten silicides t-W5Si3 along with t-WSi2 by atomic mixing at the interface. ⺠AFM results revealed increase in surface roughness and grain size which increases with ion fluence and at the highest fluence grains become stable and converted into a particular shape showing the irradiation effect at the surface also.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Garima Agarwal, Vaibhav Kulshrestha, Pratibha Sharma, I.P. Jain,