Fine-tuning of catalytic tin nanoparticles by the reverse micelle method for direct deposition of silicon nanowires by a plasma-enhanced chemical vapour technique

► The size of the tin nanoparticles could be fined-turned (85-140 nm) using the reverse micelle technique. ► The tin nanoparticles were then used as catalytic precursors to grow silicon nanowires using the plasma-enhanced chemical vapour deposition technique. ► The silicon nanowires produced were 76 and 86 nm in diameter, curved and twisted. ► The new features of this type of nanowire have the potential to be applied to the development of new photovoltaic devices.