Article ID Journal Published Year Pages File Type
609248 Journal of Colloid and Interface Science 2010 8 Pages PDF
Abstract

Here we report a scalable bottom-up technology for assembling hierarchical colloidal arrays with superhydrophobic surface. Non-close-packed (NCP) colloidal multilayers, which facilitate the formation of more hydrophobic surface than close-packed arrays due to a higher fraction of entrapped air in between colloidal particles, are first fabricated by a simple spin-coating technology. Uniform silica nanoparticles are then assembled on the NCP microsphere arrays by a second spin-coating process. After surface functionalization of silica particles with fluorosilane, the resulting hierarchical colloidal arrays exhibit superhydrophobic surface with high apparent water contact angle (159°) and low contact angle hysteresis (4.7°). The experimental results on both the wettability and contact angle hysteresis can be qualitatively explained by adapting the Cassie’s model. This spin-coating-based colloidal self-assembly technology is compatible with standard microfabrication and enables large-scale production of superhydrophobic coatings that could find important technological applications ranging from self-cleaning diffractive optics to microfluidic devices.

Graphical abstractHierarchical colloidal arrays consisting of non-close-packed microspheres and silica nanoparticles have been prepared by a scalable and microfabrication-compatible bottom-up technology. The resulting binary arrays exhibit distinctive optical diffraction and superhydrophobic surface with large water contact angle and small sliding angle.Figure optionsDownload full-size imageDownload high-quality image (116 K)Download as PowerPoint slideResearch highlights► Superhydrophobic hierarchical colloidal arrays are fabricated by a simple and scalable spin-coating technology. ► High apparent water contact angle (159°) and low contact angle hysteresis (4.7°) can be achieved. ► The wettability and contact angle hysteresis can be qualitatively explained by adapting the Cassie’s model.

Related Topics
Physical Sciences and Engineering Chemical Engineering Colloid and Surface Chemistry
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