Synthesis of 3D pore mesostructured silica films by vapor infiltration of tetraethoxysilane

Nonionic alkyl poly(oxyethylene) surfactants (Brij 56) films on a silicon substrate were treated with a tetraethoxysilane (TEOS) vapor. Mesostructured silica films were formed through a nano-phase transition under the infiltration of TEOS into the surfactant films. It was found that the calcined film had a 3D pore structure from the field emission scanning electron microscope (FE-SEM) observations in a different orientation. Grazing angle of incidence small angle X-ray scattering (GISAXS) measurement results showed that the symmetry of the film was an Fmmm space group oriented with the (010) plane parallel to the surface. The ordered structure of the films showed higher thermal stability than the films prepared by a conventional solvent-evaporation method.

Graphical abstractMesostructured silica films were synthesized using tetraethoxysilane vapors into nonionic alkyl poly(oxyethylene) surfactant films. The results of X-ray scattering measurement showed that the symmetry of the film was an Fmmm space group.Figure optionsDownload full-size imageDownload as PowerPoint slide