Article ID Journal Published Year Pages File Type
611890 Journal of Colloid and Interface Science 2008 9 Pages PDF
Abstract

Supramolecular self-assemblies in selective solvents give rise to many patterning possibilities. The diblock copolymer polystyrene-b-poly(4-vinylpyridine) (PS-P4VP) is one such polymer that self-assembles into neat nanostructures in toluene. These nanostructures once formed are highly susceptible to solvent influence. Unfortunately, for use as nanotemplates and in the synthesis of nanoparticles, the susceptibility of the films to solvents can be a problem. In this study, we present a method to stabilize the structures through chemical means in solution. We used 1,4-dibromobutane in solution to chemically crosslink the pyridine residues of each of PS-P4VP to yield a series of stable spherical aggregates. In this way, the cross-linking ratio can be precisely controlled. The solution properties were studied using dynamic light scattering and small angle X-ray scattering and the morphology of the resulting micellar film was studied using transmission electron microscopy (TEM). The size of the micelles formed was found to be dependent on the amount of cross-linking and the shape of the PS-P4VP micelles remains stable when exposed to a selective solvent for PS.

Graphical abstractCross-linked PS-P4VP aggregates.Figure optionsDownload full-size imageDownload as PowerPoint slide

Related Topics
Physical Sciences and Engineering Chemical Engineering Colloid and Surface Chemistry
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